Plasma Systems are frequently used in MEMS, semiconductor, textile, plastic, and ceramic technologies. These systems remove the organic substances on the object’s surface with the gas molecules taken into its chamber to erode or activate the surface. The plasma cleaning method provides an environmentally friendly and low-cost solution for removing organic compounds from the surface by eliminating the need to clean the surface with chemicals.
Mini Atmospheric Plasma Systems uses surface treatment consisting of an RF generator, flexible gas delivery pipe, and plasma beam head. The plasma jet flow can activate and clean material surface rapidly at low temperature without vacuum. There are such as single crystal wafers, optical components, plastics, etc. It is excellent for treating wafer surfaces before epitaxial or optical coating to obtain a higher quality thin film. This device also can use for studying Atmospheric pressure CVD.