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Mini Athmospheric Plasma System


It is used for surface Treatment, which consist of RF generator, flexible gas delivery pipe and plasma beam head. The plasma jet flow can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics etc. It is excellent for treat wafer surface before epitaxial or optical coating to obtain higher quality thin film. This device also may be used for studying Atomospheric pressure CVD.



Dimension 380x280x280mm LXWXH
Rated power 1000VA (Adjustable)
Power 220V (±15%)
Plasma Beam head One Plasma Beam with two heads
round head:10-12mm
retangular head:15-18mm
Frequency 18-25kHz
Input Gas Pressure and Working
2-2.5kg 0.12m3/min
Air, N2, Ar, He or any mixed gas ( no flammable and
explosive gases)
Working Environment Temperature: -10℃~+50℃
Relative humidity:20%>
No flammable gas
Weight 28kg