It is used for surface Treatment, which consist of RF generator, flexible gas delivery pipe and plasma beam head. The plasma jet flow can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics etc. It is excellent for treat wafer surface before epitaxial or optical coating to obtain higher quality thin film. This device also may be used for studying Atomospheric pressure CVD.
|Plasma Beam head
|One Plasma Beam with two heads
|Input Gas Pressure and Working
Air, N2, Ar, He or any mixed gas ( no flammable and
No flammable gas