![](https://www.optosenselab.co.uk/wp-content/uploads/2015/07/pecvd-furnaces.jpg)
PECVD System
July 9, 2015![](https://www.optosenselab.co.uk/wp-content/uploads/2015/07/mini-atmospheric-plasma-system.jpg)
Mini Athmospheric Plasma System
July 9, 2015Graphene Preparation System
Description
In addition applied in the Graphene Preparation field, sliding tube furnace can also be widely used for CVD experiment under reaction temperature 800-1600 ℃, vacuum sintering experiment, vacuum protective atmosphere sintering experiment, nanomaterial preparation, battery preparation, etc.
Model | OPT-T1200-S | OPT-T1400-S | OPT-T1700-S |
---|---|---|---|
Max. temperature | 1200° C | 1400° C | 1700° C |
Work temperature | 1100° C | 1300° C | 1600° C |
Heating rate | 0-20° | 0-20° | 0-15° |
Heating element | Resistance wire with Mo | SiC heating elements | MoSi2 heating elements |
Thermal couple | K type | S type | B type |
Fiber Liner | 1430 alumina fiber | 1600 alumina fiber | 1800 alumina fiber |
Temperature rise rate | 0-20°/min | ||
Slide distance | 0-20°/min | ||
Temperature accuracy | ±1℃ | ||
Temperature uniformity | ±5℃ | ||
Rated Power | 110-415V,50/60Hz | ||
Gas Control | Float flow meter/Mass flow meter | ||
Vacuum Unit | Rotary vane/Diffusion/Turbo molecular pump |